Influence of plasma exposure on physical characteristics of thin films of SnO2 obtained from SnCl4 solutions with additives of NH4F and NH4OH

Mukhamedshina, D.M.; Fedosimova, A. I.; Dmitrieva, E.A.; Lebedev, I. A.; Grushevskaya, E. A.; Ibraimova, S.A.; Mit, K.A.; Serikkanov, A.S.

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Influence of plasma exposure on physical characteristics of thin films of SnO2 obtained from SnCl4 solutions with additives of NH4F and NH4OH

Mukhamedshina, D.M.; Fedosimova, A. I.; Dmitrieva, E.A.; Lebedev, I. A.; Grushevskaya, E. A.; Ibraimova, S.A.; Mit, K.A.; Serikkanov, A.S.

URI: http://nur.nu.edu.kz/handle/123456789/3509

Дата: 2018-08-08

Аннотации:

The electrical conductivity of tin dioxide is extremely sensitive to the state of the surface in the temperature range 300-800 K, at which oxidation-reduction reactions take place on its surface. Nanocrystalline films of tin dioxide are selectively sensitive to the presence of toxic gases, organic and certain biological molecules in the surrounding atmosphere [1]. SnO2-based films are also used as transparent conductive coatings [2]. To modify the properties of the films, alloying, heat treatment, plasma treatment is used.

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