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Studies of electrical and crystal properties of ALD grown ZnO

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dc.contributor.author Mauit, Ozhet
dc.contributor.author Ainabayev, Ardak
dc.contributor.author Toktarbaiuly, Olzat
dc.contributor.author Sugurbekova, Gulnar
dc.date.accessioned 2018-09-04T10:13:23Z
dc.date.available 2018-09-04T10:13:23Z
dc.date.issued 2018-08-08
dc.identifier.citation Mauit, Ozhet, Ainabayev, Ardak, Toktarbaiuly, Olzat, Sugurbekova, Gulnar. (2018) Studies of electrical and crystal properties of ALD grown ZnO. The 6th International Conference on Nanomaterials and Advanced Energy Storage Systems. Institute of Batteries LLP, Nazarbayev University, and PI “National Laboratory Astana”. p42. en_US
dc.identifier.uri http://nur.nu.edu.kz/handle/123456789/3459
dc.description.abstract Aluminium doped ZnO (AZO) is an interesting low cost transparent conducting oxide with further use as inorganic transport layer in multilayer solar cells as well as sensors. Here we present our work on atomic layer deposited (ALD) thin films where with optimized growth conditions we can maintain resistivity below 10-3 Ωcm even in 50-65 nm thin films grown at low temperatures (530 K) We discuss the influence of crystallographic texture for ALD grown films by comparing plain glass, Al2O3 c-plane, and Al2O3 a-plane substrates. en_US
dc.language.iso en en_US
dc.publisher The 6th International Conference on Nanomaterials and Advanced Energy Storage Systems. Institute of Batteries LLP, Nazarbayev University, and PI “National Laboratory Astana”. en_US
dc.rights Attribution-NonCommercial-ShareAlike 3.0 United States *
dc.rights.uri http://creativecommons.org/licenses/by-nc-sa/3.0/us/ *
dc.subject Aluminium en_US
dc.subject atomic layer deposited (ALD) en_US
dc.title Studies of electrical and crystal properties of ALD grown ZnO en_US
dc.type Abstract en_US
workflow.import.source science


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Attribution-NonCommercial-ShareAlike 3.0 United States Except where otherwise noted, this item's license is described as Attribution-NonCommercial-ShareAlike 3.0 United States