Abstract:
Aluminium doped ZnO (AZO) is an interesting low cost transparent conducting oxide with further use as inorganic transport layer in multilayer solar cells as well as sensors. Here we present our work on atomic layer deposited (ALD) thin films where with optimized growth conditions we can maintain resistivity below 10-3 Ωcm even in 50-65 nm thin films grown at low temperatures (530 K) We discuss the influence of crystallographic texture for ALD grown films by comparing plain glass, Al2O3 c-plane, and Al2O3 a-plane substrates.