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High-performance, heteroepitaxial, nanolaminate device layers on single-crystal-like, artificial substrates and controlled self-assembly of anostructures within device layers for wide-ranging electrical and electronic applications | 119 |
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High-performance, heteroepitaxial, nanolaminate device layers on single-crystal-like, artificial substrates and controlled self-assembly of anostructures within device layers for wide-ranging electrical and electronic applications | 1 | 4 | 5 | 4 | 0 | 10 | 0 |
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High-performance, heteroepitaxial, nanolaminate device layers on single-crystal-like, artificial substrates and controlled self-assembly of anostructures within device layers for wide-ranging electrical and.pdf | 38 |
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United States | 60 |
China | 13 |
Russia | 12 |
Germany | 10 |
Sweden | 7 |
India | 4 |
Iran | 2 |
Argentina | 1 |
Canada | 1 |
France | 1 |
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Louisville | 15 |
Moscow | 8 |
Oakland | 8 |
Beijing | 7 |
Boardman | 6 |
Shanghai | 5 |
Andover | 4 |
Bangalore | 4 |
Menlo Park | 4 |
San Jose | 4 |