Surface erosion and modification by highly charged ions

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Date

2008

Authors

Insepov, Z.
Terasawa, M.
Takayama, K.

Journal Title

Journal ISSN

Volume Title

Publisher

Physical Review A

Abstract

Analyses were conducted of various models and mechanisms of highly charged ion HCI and swift-heavy ion energy transfer into a solid target, such as hollow atom formation, charge screening, neutralization, shock wave generation, crater formation, and sputtering. A plasma model of space charge neutralization based on impact ionization of semiconductors at high electric fields was developed and applied to analyze HCI impacts on Si and W. Surface erosion of semiconductor and metal surfaces caused by HCI bombardments were studied by using a molecular dynamics simulation method, and the results were compared with experimental sputtering data.

Description

Keywords

highly charged ion (HCI), surface erosion

Citation

Insepov, Z., Terasawa, M., & Takayama, K. (2008). Surface erosion and modification by highly charged ions. Physical Review A, 77(6), 062901.

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