Allain, J. P.; Hassanein, A.; Burtseva, T.; Yacout, A.; Insepov, Z.; Taj, S.; Rice, B. J.
(Proceedings of SPIE, 2004-02)
In extreme ultraviolet lithography (EUVL) environments transient plasma dynamics dictate conditions for particle/surface interactions. A critical challenge facing EUVL development is optic component lifetime both in ...