Influence of plasma exposure on physical characteristics of thin films of SnO2 obtained from SnCl4 solutions with additives of NH4F and NH4OH

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dc.contributor.authorMukhamedshina, D.M.
dc.contributor.authorFedosimova, A. I.
dc.contributor.authorDmitrieva, E.A.
dc.contributor.authorLebedev, I. A.
dc.contributor.authorGrushevskaya, E. A.
dc.contributor.authorIbraimova, S.A.
dc.contributor.authorMit, K.A.
dc.contributor.authorSerikkanov, A.S.
dc.date.accessioned2018-09-07T04:09:13Z
dc.date.available2018-09-07T04:09:13Z
dc.date.issued2018-08-08
dc.description.abstractThe electrical conductivity of tin dioxide is extremely sensitive to the state of the surface in the temperature range 300-800 K, at which oxidation-reduction reactions take place on its surface. Nanocrystalline films of tin dioxide are selectively sensitive to the presence of toxic gases, organic and certain biological molecules in the surrounding atmosphere [1]. SnO2-based films are also used as transparent conductive coatings [2]. To modify the properties of the films, alloying, heat treatment, plasma treatment is used.en_US
dc.identifier.citationMukhamedshina, D.M. et al. (2018) Influence of plasma exposure on physical characteristics of thin films of SnO2 obtained from SnCl4 solutions with additives of NH4F and NH4OH. The 6th International Conference on Nanomaterials and Advanced Energy Storage Systems. Institute of Batteries LLP, Nazarbayev University, and PI “National Laboratory Astana”. p76.en_US
dc.identifier.urihttp://nur.nu.edu.kz/handle/123456789/3509
dc.language.isoenen_US
dc.publisherThe 6th International Conference on Nanomaterials and Advanced Energy Storage Systems. Institute of Batteries LLP, Nazarbayev University, and PI “National Laboratory Astana”.en_US
dc.rightsAttribution-NonCommercial-ShareAlike 3.0 United States*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/3.0/us/*
dc.subjectoxidation-reductionen_US
dc.titleInfluence of plasma exposure on physical characteristics of thin films of SnO2 obtained from SnCl4 solutions with additives of NH4F and NH4OHen_US
dc.typeAbstracten_US
workflow.import.sourcescience

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