Optimization of deposition parameters for thin film lithium phosphorus oxynitride (LiPON)

Abstract

Thin film of lithium phosphorus oxynitride (Lipon) was successfully deposited by radio frequency (RF) magnetron sputtering technique from Li3PO4 target. The power on the target was 150 W and optimal deposition pressure of N2/Ar = ~3/1 was of 2 mTorr. Analysis of the film was done by AFM, FTIR and Raman spectroscopy, which showed incorporation of nitrogen into the film as both triply, Nt, and doubly, Nd, coordinated form. The impedance spectroscopy measurements was carried out and revealed the ionic conductivity of the sample to be 8.6 × 10 − 8 S cm-1 for optimum RF power and gas flow conditions. The electrochemical properties investigations and further development of this work will be presented at the Meeting.