A facile approach for enhancing mechanical resilience,and corrosion protection in epoxy coatings usingbismuthene nanosheets
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Wiley
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This study presents novel mechanochemical methods for the synthesis and chemical modification of bismuthine nanosheets (BINS) using a high-speed blender and planetary ball milling. Atomic force microscopy (AFM) measurements confirmed successful exfoliation of 1.5-nm BINS. Epoxy/BINS nanocomposites exhibited enhanced mechanical properties, thermal stability, and chemical resistance. Chemical modification via ball milling improved the interface and dispersion of BINS within the epoxy matrix, leading to significant enhancements in mechanical performance and chemical resistance. Compared to neat epoxy, at 0.75 vol% m-BINS, Young's modulus, impact strength and fracture toughness K IC were respectively enhanced by 30%, 88.6%, and 144.4%while these increments were 10%, 55.7%, and 97.8% for pristine BINS-based epoxy nanocomposite. A 3D finite element model of the impact test of the nanocomposite was developed to predict its behavior under high-strain rate loadings; the numerical model showed high agreement with experimental measurements. Epoxy/m-BINS nanocomposites demonstrated exceptional chemical resistance, attributed to the small lateral dimensions of m-BINS, which fill the spaces between cross-linked epoxy molecules and uniformly dis-tribute within the matrix. These findings highlight the crucial role of interface and dispersion in defining the mechanical properties of nanocomposites. Over-all, this study provides a facile and scalable method for synthesizing and modifying bismuthene, showcasing its potential for developing functional polymer nanocomposites.
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Meng, Q., Li, S., Guo, F., Demiral, M., Han, S., Meng, F., Zhang, Y., Gouda,S. Araby (2024). A facile approach for enhancing mechanical resilience, and corrosion protection in epoxy coatings using bismuthene nanosheets. Polymer Composites, 45(16), 14966–14981. https://doi.org/10.1002/pc.28814
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Except where otherwised noted, this item's license is described as Attribution-NonCommercial-NoDerivs 3.0 United States
