Secondary electron yield of emissive materials for large-area micro-channel plate detectors: surface composition and film thickness dependencies

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dc.contributor.authorJokela, S. J.
dc.contributor.authorVeryovkin, I. V.
dc.contributor.authorZinovev, A. V.
dc.contributor.authorElam, J. W.
dc.contributor.authorMane, A. U.
dc.contributor.authorPeng, Q.
dc.contributor.authorInsepov, Z.
dc.date.accessioned2017-09-27T09:21:05Z
dc.date.available2017-09-27T09:21:05Z
dc.date.issued2012
dc.description.abstractThe ongoing development of Atomic Layer Deposition (ALD) enables the use of relatively inexpensive and robust borosilicate micro-channel substrates for use as Micro-Channel Plates (MCPs). The surfaces of the channels in these glass plates are functionalized to control the conductivity as well as the Secondary Electron Yield (SEY). The extensive SEY data found in literature show significant variation for a given material depending on the apparatus, the measurement procedure, and the sample preparation and handling. We present systematic studies on the effects of film thickness and surface chemical composition on SEY. We have modified an existing ultra-high vacuum apparatus containing X-ray and Ultraviolet Photoelectron Spectrometers (XPS and UPS, respectively) by adding a modified Low Energy Electron Diffraction (LEED) module for SEY measurements. With these tools, we have characterized the secondary electron emissive properties for MgO, Al2O3, and multilayered MgO/TiO2 structures to serve as electron emissive layers in the channels of the MCPs.ru_RU
dc.identifier.citationJokela, S. J., Veryovkin, I. V., Zinovev, A. V., Elam, J. W., Mane, A. U., Peng, Q., & Insepov, Z. (2012). Secondary electron yield of emissive materials for large-area micro-channel plate detectors: surface composition and film thickness dependencies. Physics Procedia, 37, 740-747.ru_RU
dc.identifier.urihttp://nur.nu.edu.kz/handle/123456789/2729
dc.language.isoenru_RU
dc.publisherPhysics Procediaru_RU
dc.rightsOpen Access - the content is available to the general publicru_RU
dc.rightsAttribution-NonCommercial-ShareAlike 3.0 United States*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/3.0/us/*
dc.subjectAtomic Layer Deposition (ALD)ru_RU
dc.subjectMicro-Channel Plates (MCPs)ru_RU
dc.subjectSecondary Electron Yield (SEY)ru_RU
dc.titleSecondary electron yield of emissive materials for large-area micro-channel plate detectors: surface composition and film thickness dependenciesru_RU
dc.typeArticleru_RU

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