Electron-ion dynamics in laser-assisted desorption of hydrogen atoms from H-Si(111) surface

Abstract

In the framework of real time real space time-dependent density functional theory we have studied the electron-ion dynamics of a hydrogen-terminated silicon surface H-Si(111) subjected to intense laser irradiation. Two surface fragments of different sizes have been used in the simulations. When the intensity and duration of the laser exceed certain levels (which depend on the wavelength) we observe the desorption of the hydrogen atoms, while the underlying silicon layer remains essentially undamaged. Upon further increase of the laser intensity, the chemical bonds between silicon atoms break as well. The results of the simulations suggest that with an appropriate choice of laser parameters it should be possible to remove the hydrogen layer from the H-Si(111) surface in a matter of a few tens of femtoseconds. We have also observed that at high laser field intensities (2–4 V=A ° in this work) the desorption occurs even when the laser frequency is smaller than the optical gap of the silicon surface fragments. Therefore, nonlinear phenomena must play an essential role in such desorption processes