Experimental study of energy distribution in ion-beam lithography

dc.contributor.authorMyrzabekova, M. M.
dc.contributor.authorGuseinov, N.R.
dc.contributor.authorMuratov, M.M.
dc.contributor.authorGabdullin, M.T.
dc.contributor.authorNemkayeva, R. R.
dc.contributor.authorTolkynbayeva, T.
dc.contributor.authorShabelnikova, Ya. L.
dc.contributor.authorZaitsev, S. I.
dc.date.accessioned2018-09-04T09:35:54Z
dc.date.available2018-09-04T09:35:54Z
dc.date.issued2018-08-08
dc.description.abstractThe paper reports two important results. Conducted a rigorous comparison of the sensitivity of the resist is polymethylmethacrylate (PMMA) to the irradiation of electron and ion beams. It is shown that, as in the case of electron irradiation, the resist shows both positive (at low doses) and negative (at higher doses) behavior of sensitivity. But compared with the electronic exposure, sensitivity of the resist is approximately a thousand times higher to the ion exposure, both the positive and negative areas.....en_US
dc.identifier.citationMyrzabekova, M. M., Guseinov, N.R., Muratov, M.M., Gabdullin, M.T., Nemkayeva, R. R., Tolkynbayeva, T., Shabelnikova, Ya. L., Zaitsev, S. I. (2018) Experimental study of energy distribution in ion-beam lithography. The 6th International Conference on Nanomaterials and Advanced Energy Storage Systems. Institute of Batteries LLP, Nazarbayev University, and PI “National Laboratory Astana”.en_US
dc.identifier.urihttp://nur.nu.edu.kz/handle/123456789/3454
dc.language.isoenen_US
dc.publisherThe 6th International Conference on Nanomaterials and Advanced Energy Storage Systems. Institute of Batteries LLP, Nazarbayev University, and PI “National Laboratory Astana”.en_US
dc.rightsAttribution-NonCommercial-ShareAlike 3.0 United States*
dc.rights.urihttp://creativecommons.org/licenses/by-nc-sa/3.0/us/*
dc.subjectelectronen_US
dc.subjection beamsen_US
dc.titleExperimental study of energy distribution in ion-beam lithographyen_US
dc.typeAbstracten_US
workflow.import.sourcescience

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