Jokela, S. J.; Veryovkin, I. V.; Zinovev, A. V.; Elam, J. W.; Mane, A. U.; Peng, Q.; Insepov, Z.
(Physics Procedia, 2012)
The ongoing development of Atomic Layer Deposition (ALD) enables the use of relatively inexpensive and robust borosilicate micro-channel substrates for use as Micro-Channel Plates (MCPs). The surfaces of the channels in ...